Abstract
ABSTRACTDuring the past few decades, the density of magnetic storage has been improved considerably. To increase the storage capacity, it is necessary to reduce the size of magnetic grains. However, as the domain size decreases, their thermal stability will also decrease, which results in the loss of magnetization. To overcome the limit imposed by such superparamagnetic behavior, lots of recent research attentions have been focused on the patterned magnetic media. To maximize the storage density, it is preferable to create periodical magnetic patterns, in which single-domain magnetic dots are well separated from each other. In this experiment, we have utilized nanosphere lithography to create large-area well-ordered two dimension arrays of permalloy (Ni80Fe20) nanoparticles. Nanosphere lithography is an inexpensive, simple, parallel, and high throughput fabrication technique. We have employed monodisperse polystyrene beads with diameter of 650, 560, 440, 350, 280 nm to fabricate triangle-shaped permalloy (Ni80Fe20) nano-arrays with lateral dimension in the region of 170∼90 nm, and thickness in the region of 10∼50 nm. The magnetic behavior of these triangle-shaped nanomagnet arrays have been investigated by longitudinal magnetic optic Kerr effect (LMOKE) and magnetic force microscopy (MFM). It was found that the coercivity of the permalloy nanoparticle arrays increases with decreasing the thickness of the nanoparticle. This can be attributed to the interface effect between the arrays and the substrate.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.