Abstract
Burrs on the patterned metal mask could degrade the quality of pixels on the semiconductor devices during a vacuum deposition process. In this study, deburring process on the patterned metal mask was performed using abrasive deburring, pulsed electron beam irradiation, and hybrid deburring process combining abrasive deburring and electron beam irradiation. The most widely used material for the metal mask, AISI 304 stainless steel, was patterned by fiber-laser cutting. The performance of each deburring method was evaluated measuring sizes of burrs remained after processing. Surface textures were also observed by white-interferometer. Electrochemical analysis on the bare, fiber-laser cut, and LEPB-treated surface was performed to evaluate a corrosion resistance. Based on the potentiodynamic polarization test, corrosion rate and polarization resistance on the surface was calculated using Tafel extrapolation.
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