The Kirkendall Effect in Multiphase Systems

Abstract

The manifestation of the effect in multiphase diffusion couples of the Ti-Ni and Co-Si systems is discussed in terms of the velocity of the frame of reference relative to the laboratory-fixed frame of reference. It was found that, in the case of a Co/CoSi2 couple after annealing at 1100°C, two Kirkendall planes appeared in different prodct layers. The same was observed in a Ti/Ni diffusion coupled annealed at 850°C. On the contrary, in a Co/Co52Si48 reaction couple, the plane was found in none of the product layers. ThO2-particles, introduced between the initial end-members prior to the heat treatment, ended up at the e-Co/Co2Si interface. These phenomena can be predicted by the approach presented in this article.