Abstract
The physical meaning and formulas for the calculation of the different, but interrelated, types of the internal stress (IS) in thin films (instantaneous, residual, and average) are reviewed. These formulas are then applied to the cases of plated Ni and , , and alloys. The IS profiles (the IS distribution through the film thickness) are given for all cases. The relationship between the IS and the structure parameter (phase composite, crystallite size, and microstain) changes with alloy composition is discussed.
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