Abstract
Nitrogen ions with an energy of 200keV were used for the investigation of the interlayer effects of nitrogen implantation in the TiN/N2-film synthesis on the NAK80 steel. The nitrogen ion plasmas formed a broad ion mixing area at the interface between TiN film and NAK80 substrate. The measured hardness indicates the well mixing of TiN film into the NAK80 substrate, which may have an effect on increasing the adhesion of the deposited film. The chemical components and micro-hardness of the filmed surface were measured. The micro-hardness of Rockwell C-scale (HRC) was increased from 40 to 61 after the films of TiN/N2 were synthesized on the NAK80 substrate, the increased micro-hardness is attributed to the metallurgical phase change and formation of amorphous crystal due to the nitrogen implantation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
