The interfacial properties of MgCl2 thin films grown on Ti(0001)

Abstract

Photoelectron spectroscopy with synchrotron radiation (SRPES), temperature programmed desorption (TPD), low energy electron diffraction (LEED), and ion-scattering spectroscopy (ISS) were used in order to study the MgCl(2)/Ti(0001) interface. A clear hexagonal LEED pattern confirmed the presence of a quite large grain of Ti(0001) on the substrate while no new superstructure was formed after deposition of MgCl(2) either at room or at elevated temperatures. A series of high resolution spectra after step by step MgCl(2) deposition and gradual annealing indicated strong interaction between MgCl(2) and the substrate while ISS measurements showed that there is no migration of Ti atoms into the deposit layers. Additional quantities of deposited MgCl(2) grew stoichimetrically on top of the chemically active interface. Annealing at approximately 350 degrees C caused clustering of the MgCl(2) multilayer and TPD results showed that they desorbed stoichimetrically at temperatures between 360 and 380 degrees C. The interfacial TiCl(x)Mg(y) species dissociated by the disruption of the Cl-Mg bonds at temperatures higher than 400 degrees C and metallic Mg evaporated. The Cl atoms remained attached on the Ti surface but they did not form any ordered structure even after annealing at 730 degrees C. The present results indicate the occurrence of charge transfer at the Ti/MgCl(2) interface through the Cl ligands and provide valuable information for catalyst design.