Abstract
The interaction of H 2 and CO on nickel films at 77, 273 and 353 K was investigated by measurements of thermal desorption, electrical resistance and changes in work function. For this purpose the adsorption of H 2 on nickel films partially covered with CO, the adsorption of CO on nickel films partially covered with H 2, and the alternating adsorption of H 2 and CO were studied. Although reaction products of H 2 and CO could not be found under the experimental conditions chosen, clear evidence for their interaction could be seen. This interaction could be recognized by an increase in the heat of adsorption of H 2 due to the presence of CO, an increase in the amount of CO adsorbed on nickel films due to the presence of H 2, and the CO-induced transformation of H 2, adsorbed in the β 2 phase, into another phase.
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