Abstract
Chlorine adsorption on Si(100)2 × 1 at 295 K and 473 ± 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL 2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl + ions at the SiL 2,3 edge is dominated by X-ray-induced electron stimulated desorption (XESD).
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