Abstract
The wettability of aluminum melt on sapphire is shown to be sensitive to melt oxidation at liquid-solid interface. The oxidation is controlled by extruding a fresh droplet of liquid metal onto the substrate placed in a vacuum better than 10-6 mbar. The substrate temperature can reach up to 950° C. In the absence of oxidation the contact angle remains constant at 90° when the substrate temperature is lower than 800° C. It decreases to 75° at 850° C.
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