Abstract
Abstract A light exposure degradation study of electrically active polymers – high-glass-transition-temperature poly(1,4-phenylenevinylene) (Tg-PPV); poly(3-hexylthiophene-2,5-diyl) (P3HT); and poly(2-methoxy-5-(3′-7′- dimethyloctyloxy)-1,4-phenylenevinylene) (MDMO-PPV) – in pure form and blends with [6,6]-phenyl C61-butyric acid methyl ester (PCBM) was conducted to assess the influence of the employed transport layers on the materials’ photodegradation stability. Devices were prepared on quartz glass and silicon (Si) substrates with a transport layer prepared from poly(3,4-ethylenedioxythiophene):poly(4-styrene sulfonate) (PEDOT:PSS) or titanium dioxide (TiO2). Photodegradation processes in ambient air demonstrated that the polymers were thermally stable in the dark; thus, the material deteriorations not only were caused by thermal stress, but also from light-induced processes. Degradation processes of pure polymers may be considered as fast – in the order of hours – but retardable by blending of polymers with PCBM. The deposition of polymer blends on an additional layer of PEDOT:PSS or TiO2 revealed that the polymer blends studied in this work (except for P3HT) presented higher stability against polymer chain scission when deposited onto the TiO2 layer. Kinetic analysis undertaken during this work revealed that the photodegradation processes were followed by two degradation steps. Degradation kinetics were evaluated according to a Perrin-like model for absorption assessments and according to simple exponential for emission measurements.
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