The influence of Ti plasma etching pre‐treatment on mechanical properties of DLC film on cemented carbide

Abstract

The pre‐treatment of substrate surface had been a key part of DLC film preparation to improve mechanical and tribological properties. Ti plasma etching pre‐treatment was investigated in this paper as a new effective surface pre‐treatment method to substitute transition layer. This pre‐treatment used high‐energy Ti plasma to impact substrate surface. Ti plasma etched the substrate to a depth of 407 nm and increased the roughness from 1.36 to 40.39 nm. A trace layer of substrate, together with cobalt, oxides, and other impurities, was removed. Ti plasma broke some top WC crystals and combined with the free carbon ions separating from the substrate. A DLC film was deposited on the etched surface. Compared with DLC films deposited on the untreated substrate and Ti transition layer, the DLC film on the Ti plasma etched substrate had best adhesion strength of 34.14 N. The three DLC films had the same sp3 bonding carbon content, but Ti plasma etching treatment could promote the formation of sp3 bonds on the interface of substrate and DLC film. This DLC film had low friction coefficient of 0.12 and low wear rate of 5.11 × 10−7 mm3/m·N. In summary, Ti plasma etching pre‐treatment could significantly improve the adhesion of DLC film and keep its excellent tribological properties.