Abstract

A new approach to study the influence of target surface roughness on sputter yields is explored. The method is based on the experimental determination of the surface topography and the subsequent evaluation of a distribution of local angles of incidence for the incident ions. This distribution is used as input to the Monte Carlo program TRIM.SP for the calculation of the sputter yield of the target with the rough surface. Additionally, the redeposition of sputtered target atoms on the rough surface is calculated. The resulting net sputter yields determined with this procedure are in satisfactory agreement with experimental data.

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