The influence of structural defects on the electrical and infrared emission properties of VO2 thin films

Abstract

Defect engineering is widely used in the modification of transition metal oxides. In this study, defects are introduced into the polycrystalline VO2 film by the energetic Ar ion irradiation, and the influence of structural defects on the electrical and infrared emission properties of VO2 thin films have been investigated. The decrease in electrical switching ratio with the increase of defect ratio (displacement per atom (dpa)) can be described as R10°C/R90°C=2.032×(dpa+0.005)−1.8069, while the infrared modulation performance is Δε=−0.119×ln(dpa+0.061). The dpa thresholds of the electrical switching ratio and the infrared modulation performance are ηdpaRR = 0.005/atom and ηdpaΔε = 0.0426/atom, respectively, indicating that the electrical switching ratio of VO2 films is more responsive to defects than the infrared modulation performance. The relationship between transition temperature and defect ratio has be determined. Concerning electrical properties, the heating phase transition temperature can be described as TMITHeating=25.88−10.93×ln(dpa+0.01); while for infrared emission modulation, the heating phase transition temperature is given by Tε−MITHeating=31.65−8.18×ln(dpa+0.01). While reducing the phase transition temperature, the VO2 thin films still exhibit an electrical switching ratio of more than two orders of magnitude and obvious infrared modulation performance. It not only offers a viable solution for broadening the application scope of VO2 but also contributes to understanding the role of defects in VO2 thin films for further research.