Abstract
This paper evaluates the lens aberrations in microbeam and nanobeam systems caused by stray DC magnetic fields. Stray DC fields are far less influential on focussed beam spots than stray AC fields, but in order to achieve good beam-spot resolution the beamline must be aligned to the stray DC fields in the laboratory. The relative thickness of the optical elements compared to the curvature of the beam in such fields causes aberration where the beam axis differs from the optical axis of the lens system. In this paper numerical ray tracing has been used to study the influence of stray DC magnetic fields on beam resolution at the sub-micron level using typical field strengths for the Earth’s magnetic field as a case study.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
