Abstract
The focusing of a rubidium Bose–Einstein condensate via an optical lattice potential is numerically investigated. The results are compared with a classical trajectory model which underestimates the width of the focused beam. Via the inclusion of the effects of interactions into the classical trajectories model, we show that it is possible to obtain reliable estimates for the width of the focused beam when compared to numerical integration of the Gross–Pitaevskii equation. Finally, we investigate the optimal regimes for focusing and find that for a strongly interacting Bose–Einstein condensate focusing of order 20 nm may be possible.
Highlights
Atom lithography is a technique where the gradient forces applied by laser fields on a beam of atoms are used to direct the atoms into nanostructures deposited on a plane surface [1,2]
The principle is based on atom-light interactions, resulting from the dipole force [12] which causes neutral atoms to become manipulated with a near resonant laser light [12,13,14]
For simplicity of numerical calculation for the evolving Bose–Einstein condensate (BEC) through a focusing potential, we assume that the BEC is located in a stationary frame while the optical lattice is situated in a moving frame approaching the BEC along the z axis
Summary
Atom lithography is a technique where the gradient forces applied by laser fields on a beam of atoms are used to direct the atoms into nanostructures deposited on a plane surface [1,2]. The principle was experimentally demonstrated by Timp [1] in 1992 using Na deposited on Si via a standing light wave, and was followed by McClelland et al [2] to focus Cr in the presence of a 1D lattice. The principle is based on atom-light interactions, resulting from the dipole force [12] which causes neutral atoms to become manipulated with a near resonant laser light [12,13,14]. This model predicts almost perfect focusing in the absence of interactions
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