The Influence of RF power, pressure and substrate temperature on optical properties of RF Sputtered vanadium pentoxide thin films

Ibrahim K Salman

doi:10.30723/ijp.v16i39.101

Abstract

The V2O5 films were deposited on glass substrates which produce using "radio frequency (RF)"power supply and Argon gas technique. The optical properties were investigated by, UV spectroscopy at "radio frequency" (RF) power ranging from 75 - 150 Watt and gas pressure, (0.03, 0.05 and 0.007 Torr), and substrate temperature (359, 373,473 and 573) K. The UV-Visible analysis shows that the average transmittance of all films in the range 40-65 %. When the thickness has been increased the transhumance was decreased from (65-40) %. The values of energy band gap were lowered from (3.02-2.9 eV) with the increase of thickness the films in relation to an increase in power, The energy gap decreased (2.8 - 2.7) eV with an increase in the pressure and substrate temperature respectively.

Highlights

V2O5 promising materials for electronic compounds considered as a and photovoltaic applications [1]
V2O5 thin films have been prepared by various methods such as sputtering [6], vacuum evaporation [7], sol-gel [8], pulsed laser deposition [9], chemical vapor deposition [10], electron beam evaporation [11], thermal evaporation[12] and spray pyrolysis [13]
The deposition technique and the precipitation parameters such as evaporation rate, substrate temperature, sputtering power, and pressure determine the properties and thereby applications of the thin films. The process gases such as oxygen or nitrogen are not added up with the inert working gases such as argon or helium. nonreactive sputtering can be employed for both DC and RF excitation. when it is exercised with DC sputtering, the major advantage lies in high deposition rate, whereas in the case of RF sputtering, various types of targets can be used [14]

Summary

Introduction

V2O5 promising materials for electronic compounds considered as a and photovoltaic applications [1]. ‫ العراق‬،‫ بغذاد‬،‫ وزارة انعهىو وانتكىىنىجيا‬,‫ مذيريت بحىث انمىاد‬,‫هركس الفٍسٌاء الخطبٍقٍت‬3 The deposition technique and the precipitation parameters such as evaporation rate, substrate temperature, sputtering power, and pressure determine the properties and thereby applications of the thin films.

Results

Conclusion