Abstract

In this report, nanoporous anodic nickel-based thin film was prepared by a facile electrochemical approach in a fluoride containing electrolyte. The morphology, crystalline structure and electrochemical performance of the as-anodised film were investigated by scanning electron microscope, X-ray diffraction and an electrochemical workstation. The influence of processing conditions such as anodisation voltage, fluorine ion concentration and acid concentration were studied and found to have a significant effect on the capacitance of as-anodised nickel-based film. Meanwhile, the time of the anodisation is also a key factor in the performance of the nickel-based film. The specific capacitance of anodic nanoporous thin film prepared at optimised condition (1 wt-% NH4F + 80 wt-% H3PO4, 3·5 V for 45 minutes) reached 225 mF cm−2 at the scan rate of 100 mV s−1.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call