The influence of precursor gas pressure on structure and properties of fluoropolymer coatings by hot wire CVD

Alexey Safonov,Veronica Sulyaeva,Konstantin Kubrak,Sergey Starinsky,Nikolay Timoshenko,D Markovich,A Semenov,D Zaitsev

doi:10.1051/epjconf/201715900042

Alexey Safonov, Veronica Sulyaeva + Show 6 more

Open Access

https://doi.org/10.1051/epjconf/201715900042

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Abstract

In this paper we investigated the deposition process of the fluoropolymer coatings by the method of Hot Wire Chemical Vapor Deposition. The dependence of precursor gas pressure on deposition rate, structure and properties of the formed film was investigated. The study has shown that the increasing of precursor gas pressure leads to change of the film structure from porous to continuous with globules and further to solid that have different wettability. Depending on the mode of deposition was obtained the fluoropolymer coating with different structure: the wetting angle changed from 60 to 170°. A mechanism of the formation of fluoropolymer coating was discussed.

Highlights

The surface of thin fluoropolymer films with high hydrophobic properties and chemical inertness can protect from corrosive environments, to intensify heat transfer at phase transitions, improve the surface antifrictional properties, etc
The existing methods of deposition fluoropolymer films from the gas phase, such as plasma polymerization perfluoromonomer [1], magnetron sputtering [2], laser sputtering of the target, activation a gas precursor on the catalytic surface followed by deposition of a fluoropolymer on a substrate [3-5], require the improvement and the study of deposition processes
The present work aims to study the possibilities of controlling the properties of fluoropolymer coatings deposited by Hot Wire Chemical Vapor Deposition (HWCVD) or CatCVD [4-6]

Summary

Introduction

The surface of thin fluoropolymer films with high hydrophobic properties and chemical inertness can protect from corrosive environments, to intensify heat transfer at phase transitions, improve the surface antifrictional properties, etc. The existing methods of deposition fluoropolymer films from the gas phase, such as plasma polymerization perfluoromonomer [1], magnetron sputtering [2], laser sputtering of the target, activation a gas precursor on the catalytic surface followed by deposition of a fluoropolymer on a substrate [3-5], require the improvement and the study of deposition processes. The present work aims to study the possibilities of controlling the properties of fluoropolymer coatings deposited by Hot Wire Chemical Vapor Deposition (HWCVD) or CatCVD [4-6]. The method allows to control manages the structure of the resulting film by changing process parameters of deposition: the activating filament temperature [7], the substrate temperature, the precursor gas pressure, the mesh-substrate distance, etc

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