Abstract
In this research work, Ti/TiAlN multilayers of various designs were deposited on substrates pretreated by nitriding and etching procedures. The influence of the multilayer design on residual stress depth profiles was systematically analyzed for multilayers with different Titanium interlayer thicknesses. The depth dependency of stress was measured by a modified sin2ψ method, using various defined gracing incident angles and measuring angles that ensure constant penetration depths. The residual stresses were investigated by synchrotron X-ray diffraction (SXRD) at the HASYLAB at DESY in Hamburg, Germany. SXRD allows a phase specific stress evaluation of the ceramic and metallic layers of the multilayer systems and the adjacent substrate region. This investigation reveals an influence of the Ti layer thickness on the values and the slope of the residual stress profile in ceramic TiAlN layers.
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