Abstract
Indium tin oxide (ITO) is one of the few materials, which combines optical transparency in the wavelength range of visible light and electrical conductivity. It offers a wide range of applications in the field of optoelectronic devices such as solar cells or displays. To the present day, ITO is commonly deposited in a vacuum environment. Deposition under vacuum atmosphere is a cost-intensive process and not compatible with modern manufacturing techniques, like roll-to-roll processing. To overcome this limitation we propose the generation of ITO layers by deposition of ITO nanoparticles under atmospheric conditions.For the generation of functional devices structured layers are required. The exact damage threshold of nanoparticulate ITO layers is essential to minimize influence of the structuring process on the substrate.In our measurements we used three different substrates, spin coated layers, annealed layers and consolidated layers.
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