Abstract

Abstract Single-phase CuAlO 2 thin films with (0 0 l) orientation were prepared by PLD with ex situ annealing at 1173 K under N 2 atmosphere. The phase compositions of the films were found to be significantly dependent on the deposition oxygen pressure. The optimum deposition oxygen pressure for single-phase CuAlO 2 thin films was 2.3–3.2 × 10 −2 Pa. The average transmittance of the ∼50 nm-thick film in the visible region is ∼60% and the direct optical band gap is ∼3.43 eV. The single-phase film has a resistivity of 99.2 Ω cm at 300 K.

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