The influence of DMSO on the formation and photoelectrochemical properties of CdS thin films by electrodeposition method

Abstract

The homodispersed CdS nanoparticles were prepared on Sn-doped indium oxide substrates (ITO) to form smooth and uniform CdS thin films by electrodeposition method from a dimethyl sulfoxide (DMSO) solution containing cadmium chloride and sulfur. The structure and morphologies of samples were characterized by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and atomic force microscopy. The results indicate that DMSO played an important role in formation of CdS nanofilms by affecting the nucleation and growth of the CdS nanoparticles. So, a DMSO-assisted growth process was proposed as a plausible mechanism for the formation of smooth and uniform CdS nanofilms. According to the photoelectrochemical test, the CdS thin film prepared in 30 % DMSO + 70 % H2O system exhibited maximum photocurrent and open circuit potentials. This is because the deposited CdS nanoparticles had better dispersity on ITO, which facilitated the propagation and kinetic separation of photogenerated charges.