Abstract
Electron beam induced deposition (EBID) is a versatile method for the controlledfabrication of conducting, semi-conducting and non-conducting structures down to thenanometer scale. In contrast to ion beam induced deposition, EBID processes are free ofsputter effects, ion implantation and massive heat generation; however, they havemuch lower deposition rates. To push the deposition efficiency further towards itsintrinsic limits, the individual influences of the process parameters have to beexplored. In this work a platinum pre-cursor is used for the deposition of conductingnanorods on highly oriented pyrolytic graphite. The study shows the influence ofa beam defocus during deposition on the volume growth rates. The temporalevolution of volume growth rates reveals a distinct maximum which is dependent onthe defocus introduced, leading to an increase of deposited volumes by a factor2.5 after the same deposition times. The observed maximum is explained by anincreasing and saturating electron yield contributing to the final deposition processand constantly decreasing diffusion abilities of the pre-cursor molecules towardthe tip of the nanorods, which is further supported by dwell time experiments.
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