Abstract

Using scanning tunneling microscopy, the influence of a thin Au layer on the diffusion of Fe adatoms and the subsequent island nucleation on a Si(111) surface is investigated. The adsorbate induces thestructure that increases the surface mobility of subsequently deposited Fe atoms, resulting in the formation well-defined nanoclusters. Surprisingly, the domain walls—inherent to the reconstruction—do not influence the surface diffusion, which demonstrates that the passivation is of much more importance for the self-assembly than the surface corrugation. Using the decoupling of the diffusion and nucleationonthe surface and the reactionwiththe surface and conventional nucleation theory, the activation energy for surface diffusionEd = 0.61 eV and the critical cluster sizei = 3 are determined, which reveal the microscopic details of the diffusion and nucleation processes.

Highlights

  • In order to assure the continuing downscaling of electronic components, new growth methods need to be explored as currently used top-down techniques are approaching their physical limits

  • Whereas we previously investigated the morphological properties of the islands on different Au-induced surface reconstructions [3] and the Cu-induced reconstructionpffiffi[2],pffiffiwe focus on the Si(111)- 3 Â 3-Au reconstruction to investigate the microscopic details of the diffusion and nucleaptioffiffin pproffi-ffi cesses on this particular surface

  • It is elaborated that this theory is applicable for our system and as such, we present a novel approach for interpreting surface diffusion and island nucleation in reactive systems

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Summary

Introduction

In order to assure the continuing downscaling of electronic components, new growth methods need to be explored as currently used top-down techniques are approaching their physical limits. Fe atoms, is investigated by depositing 0.28 ML Fe at 400°C onto surfaces with a varying domain wall density.

Results
Conclusion
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