Abstract

The investigation of size effects appearing in the dependence of AlGaN/GaN HEMT high-frequency characteristics on channel width d and number of sections n is conducted using the notions of measure, metric and normed functional (linear) spaces. In accordance with the results obtained, in local approximation the phenomenon of similarity can exist, not only in metric spaces of heteroepitaxial structures, but also in the defined on them functional spaces of the measures of these structures’ additive electrophysical characteristics. This provides means to associate size effects of the HEMTs with their structure material fractal geometry. The approach proposed in the work gives an opportunity, not only to predict the size of the structural elements (e.g., channel width and number of sections) of the transistor with the desired characteristics, but also to reconstruct its compact model parameters, which significantly speeds up the development and optimization of the HEMTs with the desired device characteristics. At transferring to the global approximation, when the topological and fractal dimensions of the structure coincide, its electrophysical characteristics, and subsequently, the values of the compact model equivalent circuit parameters, as well as HEMT high frequency characteristics, follow the classic (linear) laws peculiar to the spaces of integer topological dimensions DT.

Highlights

  • Investigations of the influence of the electric charge carrier chaotic motion on non-linear effects in the transfer characteristics of semiconductor devices have been conducted since the 1960s

  • It has been revealed that in general cases, non-periodic and non-regular chaotic signal fluctuations follow the theory of deterministic chaos, and in local approximation can be described in notions of geometry of fractal dimensions [1,2,3,4]

  • The investigation of size effects manifested themselves in the dependence of AlGaN/Ga1−x N:Si n+ layer and encapsulating (GaN) HEMT

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Summary

Introduction

Investigations of the influence of the electric charge carrier chaotic motion on non-linear effects in the transfer characteristics of semiconductor devices (e.g., field-effect transistors, FETs) have been conducted since the 1960s. It has become clear that at submicron- and nanoscale, the conventional wisdom about current flow being a drift-diffusional process can no longer be used for a precise description of FET electrical characteristics. One example for it is the model of charge carrier kinetics in the layer of the fractal structure, using the mathematical tool of the fractal integro-differentiation [5]. The listed actions are taken in the context of the application in semiconductor materials science and exemplified by heterostructural AlGaN/GaN field-effect transistors with high electron mobility (hereinafter referred to as HEMTs)

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