The influence of 2,2′-dipyridyl on non-formaldehyde electroless copper plating

Abstract

High electroless copper deposition rates can be achieved using hypophosphite as the reducing agent. However, the high deposition rate also results in dark deposits. In the hypophosphite baths, nickel ions (0.0057 M with Ni 2+/Cu 2+ mole ratio 0.14) were used to catalyze hypophosphite oxidation. In this study, additives (e.g. 2,2′-dipyridyl) were investigated to improve the microstructure and properties of the copper deposits in the hypophosphite (non-formaldehyde) baths. The influence of 2,2′-dipyridyl on the deposit composition, structure, properties, and the electrochemical reactions of hypophosphite (oxidation) and cupric ion (reduction) have been investigated. The electroless deposition rate decreased with the addition of 2,2′-dipyridyl to the plating solution and the color of the deposits changed from dark brown to a semi-bright with improved uniformity. The deposits also had smaller crystallite size and higher (1 1 1) plane orientation with the use of 2,2′-dipyridyl. The resistivity and nickel content of the deposit were not affected by 2,2′-dipyridyl additions to the bath. The electrochemical current–voltage results show that 2,2′-dipyridyl inhibits the catalytic oxidation of hypophosphite at the active nickel site. This results in a more negative electroless deposition potential and lower deposition rate.