The impact of a large bandgap drift region in long-wavelength metamorphic photodiodes

Abstract

A comparative study of two types of metamorphic double heterojunction long-wavelength photodiodes on GaAs substrates is performed in terms of their bandwidths and responsivities. A p-i-i-n heterostructure with a large bandgap drift layer (I-InAlAs) at the cathode end of the photoabsorption region (i-InGaAs) is compared experimentally and theoretically to a p-i-n structure without a drift layer. Both types of photodiodes were fabricated using an InGaAs-InGaAlAs-InAlAs double heterostructure design to simultaneously achieve high bandwidths and high responsivities. The inclusion of an I-InAlAs drift region resulted in p-i-i-n photodiodes with larger bandwidths than p-i-n photodiodes with the same areas, or conversely a p-i-i-n photodiode can be made larger than a comparable p-i-n photodiode, but achieve the same bandwidth. Therefore, p-i-i-n photodiodes provide larger optical fiber alignment tolerances and better coupling efficiency than p-i-n photodiodes with the same bandwidths, p-i-i-n photodiodes with 10-/spl mu/m-diameter optical windows typically exhibited low dark currents of 500 pA at 5-V bias, responsivities of 0.6 A/W, and a -3-dB bandwidth of 38 GHz for 1.55-/spl mu/m operation.