The Hardness and Elastic Modulus of TiN Films as Determined by Ultra-Low Load Indentation

Abstract

The mechanical properties of a series of titanium nitride films on stainless steel substrates have been evaluated using an indentation technique with a mechanical properties microprobe (MPM). The MPM makes possible measurement of film properties without contribution by the substrate material. The titanium nitride films were deposited with a PVD technique known as sputter ion plating (SIP). Deposition substrate bias was varied from 0 to −120 V, while keeping other deposition parameters constant. With increasing negative substrate bias, dramatic increases in hardness and elastic modulus have been observed.