Abstract
Ultrathin films of cobalt were deposited by thermal evaporation on the Pd(111) surface at room temperature. The combination of low energy ion scattering (LEIS) and X-ray photoelectron spectroscopy (XPS) shows that cobalt grows forming multi-atomic layer islands. X-ray photoelectron diffraction (XPD) and low energy electron diffraction (LEED) indicate that for the first 1–2 atomic layers the cobalt islands adopt an fcc structure with the same in-plane parameter as the substrate. For thicker films, cobalt maintains the fcc stacking sequence with a gradual relaxation to the lattice parameter of bulk Co.
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