Abstract
A copper substrate soaking-treatment with FeCl3 solution is introduced to significantly reduce the initial graphene nucleation density (up to 6-fold from 0.29 to 0.05 μm−2), and the overall graphene coverage increase-rate is successfully increased.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
