Abstract
The reaction of atomic fluorine (generated by microwave discharge of sulphur hexafluoride or hexafluoroethane) with graphite surfaces has been investigated using X-ray photoelectron spectroscopy. It proved possible to identify the surface groups: CF, CF 2 and CF 3, which possessed chemical shifts from the main graphite C(1 s) peak of 4.7, 6.7 and 9.0 eV respectively. The thickness of the fluorinated films could be varied depending upon the conditions of formation. Submonolayer to multilayer quantities possessing similar characteristics to those of bulk graphite fluoride could be formed. The effect of temperature upon the rate of reaction of fluorine atoms with the basal surface was also investigated and a preliminary comparison made of the relative reactivities of the prismatic and basal surfaces. Thermal desorption of the surface groups took place between 700 and 1000°K.
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