Abstract
The formation of nickel and chromium silicides using an XeCl excimer laser has been studied. Both metals are deposited to a thickness of 500 Å by electron beam evaporation on silicon substrates. These layers are then processed using laser fluences ranging from 0.45 to 1.4 J/cm 2, and a variable number of pulses. Rutherford backscattering spectrometry (RBS) and cross-sectional transmission electron microscopy (XTEM) indicate the formation of crystalline NiSi 2 and CrSi 2 at the Ni Si and Cr Si interfaces, respectively.
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