Abstract
We describe a vacuum deposition system with in situ monitoring of the soft X-ray reflectivity (3 to 7 nm) for the thickness control of very thin films. We discuss the performances of this system used for the fabrication of multilayers for soft X-rays and extreme U-V mirrors. We present some results of geometrical and optical measurements on two types of multilayer coatings (W-Re/C and W-Re/Si) optimised respectively for about 5 and 30 nm.
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