Abstract
One key issue for all nanoimprint techniques is an appropriate method for thefabrication of desirable molds. We report on a novel flexible mold fabricationprocess—pressure-assisted molding (PAM)—for high resolution soft ultravioletnanoimprint lithography (soft UV-NIL). In PAM, enhanced master filling is achievedby applying an external pressure during the mold fabrication process. Flexiblemolds, fabricated with PAM using different pressures in the range of 10–90 kPa, arecompared to determine the role of pressures applied in the imprint performance.
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