Abstract
We have used the lower operating pressures available in ion beam sputtering to demonstrate controlled reactive oxide multi-component layer formation using substrate impingement with thermal energy neutral oxygen atoms. X-ray characterization verified the usefulness of the radical beam approach for enhancing oxide substrate surface preparation and film oxidation. Polycrystalline and epitaxial (Ni0.81Fe0.19)O (or PyO), and epitaxial (Bi0.8·Y2.2)(Fe4·Ga1)O12 (Bi-YIG) layers were successfully produced. Radical oxidation was used to tailor the exchange biasing properties of the rock-salt structured PyO structures, and induce the formation of Bi-YIG layers with in-plane easy-axis properties potentially useful for magnetic photonic device implementation.
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