Abstract
Pulsed cathodic arc and pulsed magnetron sputteredWO3 thin films were investigated using electron microscopy. It wasfound that the cathodic arc deposited material consisted of theα-WO3 phase with a high degree of crystallinity. In contrast, the magnetron sputteredmaterial was highly disordered making it difficult to determine its phase. Electronenergy-loss spectroscopy was used to study the oxygen K edge of the films and it wasfound that the near-edge fine structures of films produced by the two depositionmethods differed. The oxygen K-edge near-edge structures for various phases ofWO3 were calculated using two different self-consistent methods. Each phase was foundto exhibit a unique oxygen K edge, which would allow different phases ofWO3 to be identified using x-ray absorption spectroscopy or electron energy-lossspectroscopy. Both calculation methods predicted an oxygen K edge for theγ-WO3 phase which compared well to previous x-ray absorption spectra. In addition,a close match was found between the oxygen K edges obtained experimentallyfrom the cathodic arc deposited material and that calculated for theα-WO3 phase.
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