The electrodepositions of copper and nickel from trifluoroacetate-H 2O baths

Abstract

In the present study, the electrodepositions of copper from the Cu(CF 3COO) 2CF 3COOHH 2O bath and nickel from the Ni(CF 3COO) 2NH 4ClH 2O bath, were studied. In the copper electrodeposition from Cu(CF 3COO) 2 (100 g/l)CF 3COOH(0.1 N)H 2O bath, the cathode current efficiency showed about 100% and the anode current efficiency showed over 100% at low cd. In the nickel electrodeposition from Ni(CF 3COO) 2 (200 g/lH 4Cl(15.0 g/l)H 2O bath, the efficiencies of the cathode and anode were about 100%. The range of current density to obtain bright and smooth copper and nickel deposits were 4.0 ∼ 24 A/dm 2, 5.0 ∼ 16 A/dm 2 respectively, and the cross-section of the electrodeposits showed a granular structure. The rates of the electrodeposition of copper and nickel from the above-mentioned baths were controlled by the charge-transfer reaction in the same way as in the reaction in non-aqueous solution[1, 2].