Abstract
The work of Wolf has shown that electrodeposited magnetic films, above a thickness range of a few hundred Angstroms, could be obtained on flat metallized glass substrates, with properties adequate for computer memories. New problems arise when one tries to prepare very thin films (<300Å) or to deposit on flat or cylindrical metal substrates. The preparation of very thin films is interesting for studies such as creep, or to insure that thicker films do not present unwanted composition gradients or stresses. The influence of the nature of the plating bath on the amplitude and extension of the composition gradients and on the stresses, and consequently, on the magnetic properties (Hc, HkΔ) are examined. The deposition on metallic substrates has an obvious interest when using ground planes or wires. In this case the crystalline structure of the substrate has as much importance as its chemical activity, and we will show the usefulness of an intermediate layer of controlled grain size and isotropy. The results of these studies are related to the aging behaviour of plated films.
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