Abstract
The transparent conductive oxide thin film, AZO/Mo/AZO (OMO), with the dependence of Mo thickness is studied in the paper. The OMO films are deposited on glass substrates by a co-sputtering system at room temperature. The thickness of the AZO film is about 55 nm and the thickness of the Mo film is varied as 3, 5, 7, 10, 13 and 15 nm, respectively. The structural characteristic of the film was analyzed by X-ray diffraction and transparent electron microscopy. The electro-optical characteristic was observed through the measurement of sheet resistance and spectrophotometer. A best figure of merit of the OMO film is 2.23 × 10−4 Ω−1 at the 10 s-deposited Mo layer sample. The improvement of electro-optical characteristics of the OMO film as compared with AZO film is only occurred at very thin Mo layer.
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