The Effects of Seec and Permittivity of Dielectric on Properties of AR/NH3 DBD by Employing 1D Numerical Model

Abstract

The specific advantages of homogenous dielectric barrier discharges (DBDs) are conducive to apply them in surface treatment and film deposition. Many works devoted to this kind of discharges have been mainly focused on the noble gases (such as He, Ne, etc.) and N2. The DBD working with Ar-NH3 mixture at atmospheric pressure owns some advantages including the low cost and penning effect to generate the homogenous discharge. Therefore, more and more researches focus on the effect of gas mixing ratio on the plasma components, species densities and the discharge modes of Ar/NH3 glow discharge, which reflects the influence of the gas bulk process (e.g. ionization, excitation reactions, etc) on discharge properties <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1-3</sup> , However, there is little researches focus on the effect of the dielectric surface process (e.g. secondary electron emission (SEEC), surface reactions, etc) and permittivity, which are as important as the gas bulk process, on the properties of Ar/NH <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> glow discharge. In this work, a one-dimensional fluid model of Ar/NH <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> DBD was established to discuss the discharge mechanism and plasma properties. When we set the gas gap as 4mm, the discharge mode is firstly analyzed under different SEEC and permittivity of the barrier dielectric. Furthermore, plasma products include the intermediate and final products are tracked at each condition. The basic parameters, such as, electron temperature, density of the particles, electric field, yield of the indexed particles, etc., and their distributions in space and time are obtained and discussed. The results will help to understand the discharge behavior in Ar/NH3 mixture and guide to the applications.