Abstract
Microlens arrays (MLAs) are key optical components in laser beam homogenization. However, due to imperfect surface profiles resulting from microfabrication, the functionalities of MLAs in beam modulation could be compromised to some extent. In order to address this issue, the effects of surface profile mismatches between ideal and fabricated MLAs on beam homogenization were analyzed. Four types of surface profile errors of MLAs were modeled theoretically and numerical simulations were conducted to quantitatively estimate the effects of these profile errors on beam homogenization. In addition, experiments were conducted to validate the simulation results, revealing that profile errors leading to optical deviations located on the apex of microlenses affected beam homogenization less than deviations located further away from it. This study can provide references for the further applications of MLAs in beam homogenization.
Highlights
Uniform illuminations on target surfaces are required in many applications such as laser fusion, laser cosmetology and material processing [1,2,3]
Microlens arrays (MLAs) flowing pre-patterned photoresist posts [11,12]. This approach cannot produce MLAs with fabricated by thermal used in array beam and homogenization, a zero-order spot When with high high filling factors
Due to the nonlinear the ideal and fabricated MLAs, leading to non-uniform intensity distributions in beam effects in photoresist exposure, there is an issue of surface profile mismatches between the ideal and homogenization
Summary
Uniform illuminations on target surfaces are required in many applications such as laser fusion, laser cosmetology and material processing [1,2,3]. As a key optical component requesting high-accuracy surface profiles, the fabrication of MLAs flowing pre-patterned photoresist [11,12]. MLAs flowing pre-patterned photoresist posts [11,12] This approach cannot produce MLAs with fabricated by thermal used in array beam and homogenization, a zero-order spot When with high high filling factors Due to the nonlinear the ideal and fabricated MLAs, leading to non-uniform intensity distributions in beam effects in photoresist exposure, there is an issue of surface profile mismatches between the ideal and homogenization.
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