Abstract

Multiferroic Bi(Fe0.9Mn x 0.1)O3 (x = 2+, 3+, and 4+) thin films were prepared on Pt(111)/Ti/SiO2/Si(100) substrates by using a pulsed laser deposition method. The effects of different oxidation states of Mn used as a starting material on crystal structure, leakage current, dielectric, and ferroelectric properties were investigated. No significant change in the crystal structure was observed while electrical properties were affected by the oxidation states of Mn. A frequency-dependent dielectric relaxation region was observed in the films with Mn3+ and Mn2+, indicating the presence of space charges such as oxygen vacancies.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.