Abstract
We have investigated the effects of substrate ion bombardment and microwave electron cyclotron resonance (ECR) assisted processing on the microstructural and electrical properties of ion beam sputtered Y 1Ba 2Cu 3O x thin films. Substrate bombardment was performed using a Kaufman-type ion source or a microwave ECR gridless ion source. While substrate bombardment has been found to change the properties of the films, only in the case of ECR-assisted deposition was any sign of superconductivity observed in the as-deposited films. Results indicate that low energy oxygen ion bombardment, at low ambient pressures, simulates a high oxygen pressure ambient.
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