Abstract
The investigation of the process of altered layer formation under ion bombardment for different TiO 2 modifications (rutile, anatase and the thermal oxide) and complex oxides (PbTiO 3, La 2TiO 5r, CaTiSiO 5) was carried out by means of XPS (X-ray photoelectron spectroscopy). The role of the closest chemical environment in the process of ion sputtering of simple and complex oxides is revealed.
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