Abstract
A quantitative relationship has been identified between the deposition parameters and the electrical and optical properties of a-Si:C thin films. The major effects of the deposition parameters derive from their influence on the incorporation of water vapour into the films. Even very small changes in the amount of water vapour, as an ambient during deposition, produce very large changes in the electrical and optical properties of the films. An increase in the ambient water vapour pressure from 1 × 10 −8 to 4 × 10 −8 Torr decreases the room temperature conductivity of the resulting films by as much as three orders of magnitude. The important deposition parameters are expressed in terms of a quantity N H 2 O , which represents the actual amount of water which remains in the film.
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