Abstract
We show that bacterial adhesion on titanium (Ti) films could be radically minimized by tailoring the surface chemical stoichiometry of the films. Using a dc magnetron sputtering system, Ti films with various surface compositions, such as oxide and nitride combinations, were prepared by controlling processing parameters such as cathode power, sputtering pressure and base vacuum. The surface topography of the films was observed to be smooth and similar in all the films prepared under different conditions. The order of adhesion of the oral bacterial Porphyromonas gingivalis varied with the surface chemical stoichiometry of the Ti films. Few surface stoichiometries of typical oxide nitride combination resulted in nearly nil bacterial adhesion.
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