Abstract
PI/SiO2 composite films have been prepared by using in situ polymerization. The influences of the dosage of silane coupling agent (KH-560) on the structure and performance of PI/SiO2 composite film have been investigated. The results show that in the components without KH-560, the addition of SiO2 decreases the transmittance of the sample. Compared to the same SiO2 doping amount, the transmittance in the visible light range of the sample using KH-560 is higher than that of the sample without KH-560. After adding KH-560, the tensile strength, the elastic modulus the elongation at break of the sample have largely changed. The thermal stability and the ability to resist ultraviolet radiation of the composite film first increases and then decreases. Furthermore, the optimal dosage of KH-560 is 3%. Moreover, the addition of KH-560 has little effect on the transmittance of the PI/SiO2 composite films before and after UV irradiation.
Highlights
Organic–inorganic nanocomposite materials have the advantages of organic polymer materials, and have the characteristics of inorganic materials, which makes the organic–inorganic nanocomposite materials become an important research topic in the fields of microelectronics, electric power and aerospace in recent years [1,2,3]
For improving the process and obtain materials with better comprehensive performance, the in situ polymerization method came into being
The results show that a certain addition of KH-560 is beneficial to improve the transmittance, thermal stability and mechanical properties of PI/SiO2 films
Summary
PI/SiO2 composite films have been prepared by using in situ polymerization. Among various organic/inorganic nanocomposite materials, polyimide/silica (PI/SiO2 ) nanocomposite film has become a research hot pot due to its excellent optical permeability, mechanical properties and radiation resistance [4,5,6,7,8]. As far as PI/SiO2 nanocomposites are concerned, the organic component polyimide and the inorganic component silica are thermodynamically incompatible This incompatibility is not beneficial to the dispersion of inorganic particles in PI. The abundantly active hydroxyl groups on the surface of SiO2 , highly hydrophilic, are easy to form agglomerates or secondary aggregation, which is not conducive to its dispersion in the material [9,10].
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