The effect of secondary electrons in the ion plating deposition of amorphous hydrogenated carbon (a-C:H) films

Abstract

The role of secondary electron emission has been studied in the process of ion plating deposition of hydrogenated amorphous carbon (a-C:H) films. A grid-probe arrangement in the substrate holder allowed measurement of ion current densities and secondary electron yields (δ). In the ion energy range between about 500 and 3000 eV, the coefficients δ of a-C:H coatings were measured. The effect of secondary electrons on the carbon film growth process is discussed.