Abstract

In particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations of capacitively coupled plasmas (CCPs), the plasma-surface interaction is generally described by a simple model in which a constant secondary electron emission coefficient (SEEC) is assumed for ions bombarding the electrodes. In most PIC/MCC studies of CCPs, this coefficient is set to γ = 0.1, independent of the energy of the incident particle, the electrode material, and the surface conditions. Here, the effects of implementing energy-dependent secondary electron yields for ions, fast neutrals, and taking surface conditions into account in PIC/MCC simulations is investigated. Simulations are performed using self-consistently calculated effective SEECs, , for ‘clean’ (e.g., heavily sputtered) and ‘dirty’ (e.g., oxidized) metal surfaces in single- and dual-frequency discharges in argon and the results are compared to those obtained by assuming a constant secondary electron yield of for ions. In single-frequency (13.56 MHz) discharges operated under conditions of low heavy particle energies at the electrodes, the pressure and voltage at which the transition between the α- and γ-mode electron power absorption occurs are found to strongly depend on the surface conditions. For ‘dirty’ surfaces, the discharge operates in α-mode for all conditions investigated due to a low effective SEEC. In classical dual-frequency (1.937 MHz + 27.12 MHz) discharges significantly increases with increasing low-frequency voltage amplitude, , for dirty surfaces. This is due to the effect of on the heavy particle energies at the electrodes, which negatively influences the quality of the separate control of ion properties at the electrodes. The new results on the separate control of ion properties in such discharges indicate significant differences compared to previous results obtained with different constant values of γ.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call