The Effect of Potassium Fluoride Postdeposition Treatments on the Optoelectronic Properties of Cu(In,Ga)Se2 Single Crystals

Abstract

The power conversion efficiency boost of Cu(In,Ga)Se2 in the past years has been possible due to the incorporation of heavy alkali atoms. Their addition through postdeposition treatments results in an improvement of the open‐circuit voltage, the origin of which has been associated with grain boundaries. Herein, the effect of potassium fluoride postdeposition treatments on the optoelectronic properties of a series of sodium‐free Cu(In,Ga)Se2 single crystals with varying Cu and Ga content is discussed. Results suggest that improvement of the quasi‐Fermi level splitting can be achieved in the absence of grain boundaries, being greater in low‐gallium Cu‐poor absorbers. Secondary ion mass spectrometry reveals the presence of potassium inside the bulk of the films, suggesting that transport of potassium can occur through grain interiors. In addition, a type inversion from n to p in potassium fluoride‐treated low‐gallium Cu(In,Ga)Se2 is observed, which along with study of the carrier lifetime demonstrates that potassium can act as a dopant. The fact that potassium on its own can alter the optoelectronic properties of Cu(In,Ga)Se2 single crystals demonstrates that the effect of postdeposition treatments goes beyond grain boundary passivation.